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Saturday, December 8, 2007

Hafnium-based Intel® 45nm Process Technology

Two words: relentless innovation. Using dramtaically new materials including hafnium-based circuity, new Intel® 45nm Hi-k metal gate silicon technology helps to dramatically increase processer energy efficiency and performance for an unprecedented computing experiance.
With this breakthrough transistor technology, Intel is manufacturing serious advantage into every hafnium-based Intel 45nm Hi-k chip.
These revolutionary new processers empower a more enjoyable computing experience for your gaming, multimedia and multitasking, at work, at home, and at play.

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